Prize Recipient

"For her experimental skills and originality, recently displayed by pioneering work in the new field of ‘mesotaxy’. In this technique, ion implantation produces buried epitaxial metallic and insulating layers in semiconductors; it is also used for controlled radiation damage to characterize high Tc super-conductors, with applications to the fabrication of SQUID devices. Her earlier work on fabricating ultra-thin wires and 2D metallic and superconducting layers, which is also noteworthy, served as a basis for these advances."