66th Annual Gaseous Electronics Conference
September 30 - October 4, 2013 • Princeton, New Jersey

Invited Speakers

The invited speakers, their affiliations and tentative titles of their presentations for the 2013 GEC are:

Foundation Talk
Rod Boswell, The Australian National University, Thinking and doing, a long way to the top in commercialization

Opening Tutorial
Stewart Prager, Princeton Plasma Physics Laboratory, The path to magnetic fusion energy

Heavy-Particle Collisions
Mitch Pindzola, Auburn University, Antiproton-impact single and double ionization of He and H2,
David Schultz, University of North Texas, Heavy particle collisions in astrophysical, fusion, and other plasmas

Electron-Molecule Collisions
Oleg Zatsarinny, Drake University, Large-scale B-spline R-matrix calculations of the excitation and ionization processes for complex atoms
Steve Guberman, Institute for Scientific Research, Winchester, MA, Recent theoretical studies of dissociative recombination
Ali Belkacem, LBNL, Experimental imaging of the dissociation dynamics of polyatomic molecules following resonant low-energy electron attachment
Thomas Nicola Rescigno, LBNL, The dynamics of dissociative electron attachment to small polyatomic molecules
Hari Hara Kumar Chaluvadi, Missouri University of Science and Technology, Accuracy of theory for calculating electron impact ionization of molecules
Dario Mitnik, IAFE - Ciudad Universitaria (Argentina), Collisional problems treated by the hyperspherical generalized sturmian method

Electron and Positron Scattering
Adric Jones, UCSD, Progress towards a dense positronium gas
Sandra J. Ward, University of North Texas, Positron collisions from simple atoms and positronium - hydrogen collisions

Atmospheric Pressure Plasmas
Jan Schäfer, INP Greifswald Leibniz-Institut für Plasmaforschung und Technologie e. V., Temperature diagnostics of a non-thermal plasma jet at atmospheric pressure
Hirotaka Toyoda, Nagoya University, Production of microwave atmospheric pressure plasma inside slot
Fumiyoshi Tochikubo, Tokyo Metropolitan University, Plasma-liquid interfacial phenomena in atmospheric pressure glow discharge with liquid electrode

Plasmas for nanotechnologies, flexible electronics and other emerging applications
Toshiaki Kato, Tohoku University, Controllable graphene growth using novel plasma catalytic deposition
Mohan Sankaran, Case Western Reserve University, Synthesis and processing of carbon-based nano materials near ambient conditions via microplasma technology
Kaushik Kumar, TEL Technology Center, America, Challenges in the plasma etch process development in the sub-20nm technology nodes

Green plasma technologies: environmental and energy applications
Richard van de Sanden, Dutch Institute for Fundamental Energy Research, Energy storage in Solar Fuels: a plasma perspective
Tomohiro Nozaki, Tokyo Institute of Technology, Plasma enhanced C1 chemistry for green technology

Plasma Modeling
Thomas Mussenbrock, Ruhr University Bochum, Particle based discharge simulations: electron heating and electromagnetic effects
Vladimir Kolobov, CFD Research Corporation, Towards adaptive kinetic-fluid simulations of weakly ionized plasmas
Dmytro Sydorenko, University of Alberta, Particle-in-cell simulations of discharges with intense electron emission
Natalia Babaeva, The University of Michigan, Challenges in plasma modeling: from streamers in sprites to plasma- living tissue interactions
Miles Turner, Dublin City University, Verification and validation in low-temperature plasma physics

Plasma Diagnostics
Thomas Schwarz-Selinger, Max-Planck-Institut für Plasmaphysik, Quantitative diagnostic of reactive, multicomponent low-temperature plasmas
Yakov Krasik, Technion, Israel, Tutorial on underwater electrical discharges: main features and applications

Novel Plasma Applications
Michael Keidar, George Washington University, Physics and medical applications of cold atmospheric plasma
David Staack, Texas A&M University, Microplasmas in liquids

Plasma sheaths
Mark A. Sobolewski, National Institute of Standards and Technology, Sheaths in RF plasmas
Trevor Lafleur, Ecole Polytechnique, Self-bias formation in capacitively-coupled plasmas excited by arbitrary waveforms