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Chemical etching can spontaneously transform a flat silicon surface into one consisting of nanoscale facets
Presented Thursday, March 18, 2010
Marc F. Faggin
Melissa A. Hines
Department of Chemistry and Chemical Biology
Chemical etching can spontaneously transform a flat silicon surface into one consisting of nanoscale facets, a process that covers the surface with tiny pyramids.
Reporters may freely use this image as long as they include the following credit: "Image courtesy of M.Hines/Cornell University".
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